Fluorine is an active element required for all dry chamber cleaning processes. Our Generation-F® on-site fluorine generators provide the lowest cost-per-clean for thermal furnace process, plasma-enhanced and thermal CVD tool dry-chamber cleaning. Fluorine is the ideal replacement for fluorine-bearing gases such as NF3, ClF3, SF6 and F2/N2 mixtures where inactive components can compromise cleaning performance.
Ultra-pure fluorine gas delivered from Generation-F systems offers the highest cleaning performance, shorter cleaning time, productivity gains relative to CVD tools, and reduced energy consumption and environmental impact thanks to zero Global Warming Potential (GWP).
In multiple patterning process, which is very critical for ULSI devices, fluorine can maintain very stable chamber conditions, especially temperature during the cleaning process. It offers very stable deposition process after chamber cleaning.
This series comes in a modular design capable of meeting all flow, concentration and volume requirements ranging from one tonne to hundreds of tonnes each year So whether you operate a single tool or a large-scale fab, we have the solution for you. Benefits and highlights of Generation-F on-site generators include:
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Improved productivity thanks to safe, reliable supply of high-purity fluorine
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Sustainable alternative to high-GWP gases nitrogen trifluoride (NF3) and sulphur hexafluoride (SF6) for CVD chamber cleaning
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Elimination of large volume, high-pressure storage facilities
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Large installed base
Currently, more than 30 Generation-F systems are installed worldwide.